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QDI 2010 Film™ Microspectrophotometer

The QDI 2010 Film™ microspectrometer is designed for thin film thickness measurement. It incorporates the latest technological advances in optics, spectroscopy and software to deliver the best performance for film thickness measurement capabilities for many devices. It is easy to use yet able to non-destructively measure film thickness of even sub-micron sized features. As such, the QDI 2010 Film™ represents a giant leap forward in film thickness measurement and UV-visible-NIR microspectroscopy.

The QDI 2010 Film™ microspectrophotometer combines the latest technologies to allow the user to measure thin film thickness of both opaque and transparent samples areas as small as one micron. And all with the same instrument! The instrument includes QDI FilmPro™ thin film software and the option for automation. Additionally, the samples are viewed simultaneously during microspectral data acquisition. This allows the user to visually and spectroscopically locate and analyze their sample.

The QDI 2010 Film™ microspectrophotometer is simple to use, the measurements are non-contact, non-destructive and the spectral data is unmatched.

The QDI 2010 Film™ Microspectrometer can take spectra and images from the deep ultraviolet to near infrared with one seamless operation. It can acquire microspectra and images in absorbance, reflectance, and fluorescence. The microspectrometer is offered with both the DirecVu™ to view samples by eye as well as with a high resolution UV-visible-NIR digital imaging system. The lit blue base and lit hexagonal optical head are both trademarks of CRAIC Technologies, Inc.
Applications
  • OLED's
  • Flat Panel Color Masks
  • Semiconductor Film Thickness
  • MEMS devices
  • Optical components
Key Advantages
  • Deep UV to NIR microspectroscopy
  • Deep UV to NIR imaging
  • Integrated TE cooled array detector for low noise and long term stability
  • Ultraviolet-visible-NIR spectra in one shot... No changing optics!
  • Transmission, reflectance, fluorescence, and polarization spectroscopy of microscopic samples...all with the same microspectrometer
  • Variable measurement areas down to sub-micron
  • Superior image both with eyepieces and digital imaging
  • Easy to use and maintain
Options
  • Hardware including automation and specialized analysis packages
  • Software including specialized data analysis, databasing and imaging.

Silicon dioxide on silicon Film thickness interferogram